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1-1104 (technical revision)
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It is shipped as a liquefied gas under its own vapor pressure
SEMI M45 — Specification for 300 mm Wafer Shipping System
The specimen cross-sectional area shall be constant to within ±1% of the average area as determined by measurements along the crystal axis (refer to ¶ 12
MF052500 - SEMI MF525 - Test Method for Measuring Resistivity of Silicon Wafers Using a Spreading Resistance Probe Revision:SEMI MF525-0312 - Superseded 1-1104 (technical revision)This Test Method covers the measurement of the resistivity of a silicon substrate of known orientation and type, or of a uniform silicon epitaxial layer of known orientation and type that is deposited on a substrate of the same or opposite type. Resistivity of the epitaxial films can be evaluated without the necessity of thin film correction factors provided that the ratio of layer thickness to effective probe contact radius is greater than 20. This