D01200 - SEMI D12 - Specification for Edge Condition of Flat Panel Display (FPD) Substrates Revision:SEMI D12-95 (Reapproved 0703) - Inactive and devices for wafers that

and devices for wafers that have undergone processing and are entering 3D stacking process steps

SEMI C40-1110 (Reapproved 0618)

The purpose of this Document is to provide specification for hydrogen chloride (HCl) that is used in the semiconductor industry

hard mask and copper diffusion barrier precursor

orgで入手可能になり，2005年3月発行に至る。

D01200 - SEMI D12 - Specification for Edge Condition of Flat Panel Display (FPD) Substrates Revision:SEMI D12-95 (Reapproved 0703) - Inactive and devices for wafers thatThis Standard was technically approved by the Flat Panel Display Global Technical Committee. This edition was approved for publication by the global Audits and Reviews Subcommittee on April 28, 2003. Available at www. semi. org in July 2003; originally published in 1995. NOTICE: This Standard or Safety Guideline has an Inactive Status because the conditions to maintain Current Status have not been met. Inactive Standards or Safety Guidelines are