C08900 - SEMI C89 - Test Method for Particle Removal Performance of Liquid Filter Rated Below 30 nm with Inductively Coupled Plasma – Mass Spectroscopy (ICP-MS) Revision:SEMI C89-0116 - Current SEMI E5-0302 (technical revision)

SEMI E5-0302 (technical revision)

1  The scope of this Standard is grades of hydrofluoric acid used in the semiconductor industry

6-0701 (technical revision)

2  This Guide describes wafer stacks with nominal diameter of 300 mm

the applicability of this specification is not restricted or limited to this region alone

C08900 - SEMI C89 - Test Method for Particle Removal Performance of Liquid Filter Rated Below 30 nm with Inductively Coupled Plasma – Mass Spectroscopy (ICP-MS) Revision:SEMI C89-0116 - Current SEMI E5-0302 (technical revision)This Document is to provide a standard of mono dispersed gold nanoparticle (GNP) challenge test for liquid filter rated below 30 nm using inductively coupled plasma mass spectroscopy (ICP MS). This Document covers a mono dispersed GNP challenge test method for below 30 nm rated liquid filter. This Document defines a test condition for mono dispersed GNP challenge test. The following areas are to be addressed in this Document: The test condition such